Vistec group presenting itself at “SEMICON West 2009′ Jena/San Francisco, July 13, 2009 the Vistec electron beam lithography group takes part in the most important trade fair for the semiconductor industry in North America. From 14-16 July 2009 the Vistec Group on the joint stand of the Central German semiconductor and electronics network Silicon Saxony will present its range of products and performance. In the Moscone Center in San Francisco more than 1,400 international exhibitors have announced on an exhibition area of 60,000 m. “As an international company, is for the Vistec group important to follow current developments in the very important North American market. “This the SEMICON West offers us an excellent opportunity”, explains Ines Stolberg, Marketing Manager at the Vistec electron beam lithography group. “Also, we want to maintain existing customer relationships and new customers for our high-performance electron beam exposure systems in the areas of application of electron beam direct writing for” rapid prototyping and design development as well as for the mask write win.” On the industry gathering, the company introduces the two electron beam instrument series Vistec SB3055 and Vistec SB250 visitors. Both series are developed in Jena (Thuringia) and manufactured. Based on the variable shaped beam technology (VSB, principle of variable shape beam) are both device lines in semiconductor manufacturing and scientific research facilities used.
Vistec electron beam lithography group Vistec electron beam lithography group: Is an internationally active manufacturer of electron beam exposure systems. The group, a world leading manufacturer of electron beam exposure systems, which work according to the so-called point beam principle, and the Thuringian Vistec electron beam GmbH, includes the American Vistec lithography Inc., which more than 30 years of experience in the development and manufacture of VSB devices (variable shaped beam technology) has. Due to this broad technology portfolio, Vistec systems worldwide in the industry both in research institutions and universities are back. Applications include semiconductor, Nano – and biotechnology, and photonic applications.
